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Relaxing (Neuro)cosmetic Mask

Relaxing (Neuro)cosmetic Mask

Regular price $16.00 USD
Regular price Sale price $16.00 USD
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Cie Luxe is the official US distributor for ID Swiss Botanicals.
The Neurocosmetic Relaxing Mask offers your skin an intense treatment for a targeted and deep action of our active ingredients. An immersive experience combining serenity and technology. Formulated with 99.4% natural ingredients.
• 24hr Hydration: Caprylic Triglyceride offers a mixture of fatty acids that helps replenish the skin's surface and prevent dehydration.
• Reduction of Inflammation: Extract of Swiss Pinus Cembra is the active ingredient extracted from a Swiss Scots pine native to the Alps, known to protect the skin and reduce its inflammation.
• Multi Complexion Assist: Kakadu Plum is a superfruit with unparalleled vitamin C content and rich in antioxidants. Reduces signs of fatigue and enhances skin's radiance.
• ID Swiss Beauty Complex™: A cutting-edge botanical complex that promotes diffusion into the skin and increases ingredients' bioavailability. Encapsulated in a nano-emulsion and then combined with soothing active ingredients, a novel combination that offers a powerful calming effect and makes our formulas unique.
 Suitable for all skin types, recommended for sensitive skin. Dermatalogically Tested.


Size:
 5 Masks, each 0.67 fl. oz. (20 ml)

Yuka Score:
 86/100 (EXCELLENT)

Ingredients: Aqua (water), glycerin, propanediol, pentylene glycol, c14-22 alcohols, caprylic/capric triglyceride, coco-caprylate/caprate, saccharide isomerate, glyceryl caprylate, c12-20 alkyl glucoside, maltooligosyl glucoside, lysolecithin, sclerotium gum, hydrogenated starch hydrolysate, parfum (fragrance), pullulan, xanthan gum, alcohol, sodium phytate, ethylhexylglycerin, cannabis sativa seed oil, tocopherol, glucose, glycine soja (soybean) oil, lecithin, silica, citric acid, sodium citrate, terminalia ferdinandiana fruit extract, cannabis sativa leaf extract, linalool, pinus cembra wood extract, helianthus annuus (sunflower) seed oil. 
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